English
SUNFUN Group specializes in intelligent and sustainable industrial development. Driving quality advancement in manufacturing across China and the globe through technological innovation, we are committed to creating green value for a better human life.
We have deep expertise in smart energy and smart manufacturing, consistently achieving breakthroughs in precision production. Our capabilities range from 0.001-mm precision machining to the manufacture of components weighing from 0.1 grams to 150 tons. We maintain energy consumption within 0.1% and implement fully intelligent process management—all supported by four decades of specialized experience!
Innovation is the foundation of the growth of our group. We have built an open and collaborative innovation ecosystem, partnering with governments, enterprises, universities, and institutions to enable cooperative innovation and shared value, injecting sustained momentum into the industry.<br/>
As an accredited technology enterprise with its own institute and talent academy, SUNFUN has completed more than ten national-level R&D tasks and undertaken major projects commissioned by agencies such as the NDRC, MOST, and MIIT.
This series of equipment adopts the central rotating substrate frame of magnetic fluid sealing technology, which has high production capacity and ensures the repeatability and uniformity of the film. The optimized exhaust characteristics and heating capacity shorten the coating time. The RF ion source is equipped to improve the overall optical performance of the film.
It is widely used for depositing AR, AS/ AF, decorative film, ITO film, HR film on smartphones, tablets, and vehicles, etc.
| Model | HCEB-600 | HCEB-900HC | EB-1100 HCE | B-1350 HC | EB-1550H | CEB-1800 | HCEB-2350 | HCEB-2700 |
| Size(mm) | φ600xH800 | φ900xH1100 | φ1100xH1520 | φ1350xH1610 | φ1550xH1810 | φ1800xH1850 | φ2350xH1510 | φ2700xH1850 |
| DOME(mm) | φ450 | φ750 | φ950 | φ1200 | Φ1400 | Φ1600 | φ2250 | φ2640 |
| Rotational Speed | 10~60RPM(variable) | |||||||
| Thickness Monitor | Quartz Crystal or Optical Monitor | |||||||
| Lon Source | RF/Kaufman-type/End-hall-type lon beam Source | |||||||
| Evaporation | E-Beam Source(Dual source co-steaming optional), Multi-point crucible hearth or annular hearth, Thermal source | |||||||
| Wavelength(nm) | 300~1560 | 380~780 | ||||||
