English
SUNFUN Group specializes in intelligent and sustainable industrial development. Driving quality advancement in manufacturing across China and the globe through technological innovation, we are committed to creating green value for a better human life.
We have deep expertise in smart energy and smart manufacturing, consistently achieving breakthroughs in precision production. Our capabilities range from 0.001-mm precision machining to the manufacture of components weighing from 0.1 grams to 150 tons. We maintain energy consumption within 0.1% and implement fully intelligent process management—all supported by four decades of specialized experience!
Innovation is the foundation of the growth of our group. We have built an open and collaborative innovation ecosystem, partnering with governments, enterprises, universities, and institutions to enable cooperative innovation and shared value, injecting sustained momentum into the industry.<br/>
As an accredited technology enterprise with its own institute and talent academy, SUNFUN has completed more than ten national-level R&D tasks and undertaken major projects commissioned by agencies such as the NDRC, MOST, and MIIT.
Product Features
Performance advantages: High hardness (Vickers hardness over 2000HV, wear-resistant and damage-resistant), high strength (strong bending resistance, not easy to deform), high temperature resistance(melting point over 2000 °C, suitable for high-temperature scenarios), corrosion resistance (acid and alkali resistance, suitable for complex environments), good insulation (no static interference, protecting components).
Precision and cleanliness: High dimensional accuracy (up to ±0.001mm), smooth surface (Ra as low as 0.1), no metal ion precipitation, little particle shedding, suitable for high cleanliness requirements such as semiconductors.
Application fit: Lightweight (density lower than metal), flexible, customizable shape/structure for semiconductor wafer handling, precision machining and other scenarios with relatively high cost performance.
